January 18, 2017
VIEWPOINT 2017: Greg DeLarge, President, Plasma Etch, Inc.
We recently introduced our patented gasless etching technology in our Mark II line of plasma systems. This allows us to etch and desmear without CF4 gas. The long term cost and environmental benefits of this technology cannot be overstated.
Our customers have shown a lot of excitement about this new Mark II offering. This product line will drive large system sales in 2017.
We will be demonstrating a PE-50 vacuum plasma system along with a Plasma Wand at MD&M West in February and MD&M East in June. We'll also be attending IPC Apex in February. Finally, look for our PE-50 demonstrations at Semicon West in July.
Greg DeLarge, President
Plasma Etch, Inc.
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