Manassas, Va. – ZESTRON America, the global leader in precision cleaning products and services and Austin American Technology (AAT), manufacturer of high performance cleaning systems will be presenting the findings from the “Fluid Flow Mechanics -Key to Low Standoff Cleaning” study at the upcoming APEX Cleaning Technical Session on Wednesday, April 2^nd from 1:30pm to 3:30pm at the Mandalay Bay Resort & Convention Center, Las Vegas, NV.

In this combined technical paper, Mr. Umut Tosun, M.S. Chem.Eng., Application Technology Manager with ZESTRON America and Mr. Steve Stach, President and CEO of AAT have set out the impact of mechanical versus chemical contributions during the removal of contamination under 1-2 MIL standoff components, respectively. To validate the results obtained, extensive studies were conducted, including actual user case studies, specifically prepared test-assemblies, iterative experimentation, as well as new mechanical innovations that will help users in the future. The latter includes but is not limited to various flow patterns as well as industry leading cleaning agents. The authors have also included experimental data to address fluid flow mechanics, temperature and concentration related effects.

Initial obtained results indicate that the cleanability of residues under low standoff components has become a non-trivial issue. “Not only are residues becoming harder to remove, but also at the same token, the penetration of the cleaning agent seems to be in direct relationship with the geometry and height of the components used,” said Umut Tosun, accredited cleaning expert.

For registration or more information regarding the APEX Conference and exhibition, please visit http://www.goipcshows.org/ or call 877-472-4724. For additional information on ZESTRON’s latest technology and support capability, please visit ZESTRON America online at http://www.zestron.com/ or via email at infoUSA@zestron.com.