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February 15, 2008
KIC to Showcase 24/7 Process Monitoring at Nepcon Shanghai
San Diego — KIC, the leader of thermal process development and control products, and winner of multiple industry awards, will showcase its 24/7 Process Monitor in booth 2G30 at the upcoming NEPCON China/EMT China 2008 exhibition and conference -scheduled to take place April 8-11, 2008 in Shanghai, PR China.
KIC’s 24/7 Process Monitoring brings an innovative level of automation to the thermal process: Automatic profiling of each and every product, around-the-clock monitoring, SPC charting, analysis, documentation and production traceability — all in a single, intuitive product. Continuous tracking occurs in the background, never interrupting production. The real-time process data enables engineers and managers to make crucial cost containment and quality control decisions, thereby improving overall quality and consistency of performance, as well as providing significant cost benefits to users.
KIC 24/7 uses custom probes installed inside the oven at the product level to gather and record real-time thermal process data for every product. The KIC 24/7 automatically charts all critical process specs: peak temperature, soak time, time above liquidous, etc. The data is plotted on real-time control charts and process capability (Cpk) is calculated for each specification. The overall process window index (PWI) is charted, providing a real-time Cpk for the entire process. Any process drift outside of control limits or defined Cpk value will immediately trigger an alarm. Real-time Cpk tracking provides a zero-defect, fail-safe system that automatically identifies potential defects before they occur. KIC has creatively applied its separate monitoring technologies into this new, single process monitoring system in order to advance the thermal process, which is a very significant challenge in today’s industry.
Contact:
KIC
Allene Bailey
http://www.kicthermal.com
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